Low-Stress Cutting Systems for Hard & Brittle Electronic Materials
Brittle electronic plates, including ceramic substrates, semiconductor wafers, and glass-ceramic components, present unique machining challenges due to their high hardness and low fracture toughness. Precision machining is required to achieve tight dimensional tolerances while avoiding surface damage and cracking.
Our diamond wire cutting systems excel at ultra-precise machining of hard brittle materials, achieving micron-level accuracy and minimal surface damage. The advanced cutting technology controls subsurface damage effectively, making it ideal for microelectronic components, power devices, and sensor manufacturing.
Engineered for the most demanding semiconductor and electronics applications, our systems feature high-rigidity frames and intelligent process control. They deliver stable, repeatable performance for R&D prototypes and high-volume production lines alike, meeting the strict quality standards of the 5G, aerospace, and medical electronics industries.
Our diamond wire cutting systems are engineered for the complex processing of hard, brittle electronic plates, including ceramic substrates, semiconductor wafers, and glass-ceramic components. The advanced cutting technology achieves ultra-fine slicing with minimal surface damage, making it ideal for microelectronic components, power devices, and sensor manufacturing. With customizable cutting paths and high-rigidity machine frames, it delivers consistent accuracy for even the most challenging brittle materials.
| NO. | Parameter | Specification |
| 1 | Model | TCQF400LNC-FM-HL |
| 2 | Cutting Principle | Endless diamond wire / Physical cutting |
| 3 | Cutting Functions | Slicing / Angle & Profile Cutting |
| 4 | Maximum Workpiece Size(mm) | Φ600mm, Height 500mm |
| 5 | Worktable Size(mm) | Ø380 转台 |
| 6 | Cutting Planarity Accuracy(mm) | 0.08 |
| 7 | Surface Roughness(μm) | Ra 0.8μm |
| 8 | Wire Specification(mm) | Ø0.65–1.0/2580 |
| 9 | Tension System | Constant Wire Tension Control |
| 10 | Guide Wheel Quantity | 4 wheels |
| 11 | Drive Motor | Servo motor |
| 12 | Wire Speed (m/s) | 51Max（Adjustable） |
| 13 | Total Power(kW) | 2.8 |
| 14 | Voltage | 220v 50Hz |
| 15 | Control System | Custom-developed Tongcheng T32 system |
| 16 | Footprint (L×W×H)(mm) | 1350×1066×1968 |
| 17 | Gross Weight kg | 720 |
Build a measurable diamond wire saw factory acceptance test covering safety, capability, wafers, consumables, data, training and SAT handoff.
Build a subsurface-damage and finishing-allowance budget for diamond wire saw cutting of SiC, silicon, sapphire, glass and ceramics.
Decide when batch or stack cutting advanced ceramics improves throughput without sacrificing chips, thickness, cooling or traceability.
Evaluate ultra-fine diamond wire for thin silicon wafer slicing using kerf, bow, breakage, warp, finishing loss and cost per accepted wafer.
Build a practical diamond wire saw preventive-maintenance plan for guide wheels, tension, alignment, coolant and repeatable wafer quality.
Learn how diamond wire saw cutting can improve graphite component yield for SiC crystal growth while controlling dust, geometry and contamination.
