シリコンウェーハのスライシングソリューション


High-precision Diamond Wire Cutting Machines for Wafer Processing

Indoor wafer slicing systems for semiconductor fabs, R&D labs, pilot lines and other advanced manufacturing facilities require a combination of ultra-precision, high material yield and long-term operational stability. They deliver consistent, damage-free slicing of hard-brittle materials without compromising surface quality or production throughput.

Cutting precision and process efficiency play a particularly critical role in the design of diamond wire cutting equipment for semiconductor manufacturing. They must also be engineered to be as resource-efficient as possible in terms of footprint, installation effort and routine maintenance. The core component that defines a cutting system’s performance is the diamond wire cutting mechanism and its integrated control modules.

General semiconductor cutting solutions from ewirexon therefore combine exceptional slicing accuracy, compact equipment design, flexible material compatibility and optimized production efficiency. In this way, we support you in meeting strict industry quality standards and regulatory requirements, especially for high-yield semiconductor substrate processing.

シリコンウェーハのスライシングソリューション

ewirexon Semiconductor Diamond Wire Cutters

The diamond wire cutting systems of the ewirexon have been specially developed for use in semiconductor slicing, R&D prototyping and pilot production lines. They are engineered to meet the most stringent precision and yield performance requirements specified for wafer and substrate processing.

With their optimized wire path and tension control mechanisms for maximum cutting stability, ewirexon general cutting systems cover a versatile operating range with highest efficiency. This gives semiconductor equipment manufacturers and material processing facilities the opportunity to drastically reduce their configuration complexity and thus the costs and effort involved in system integration and vendor management.

Reduced total cost of ownership & enhanced production performance:

 

Thanks to factory-calibrated wire tension control and ultra-stable cutting mechanisms, no on-site re-calibration is required after installation.

Compact, modular equipment design simplifies integration, extends maintenance intervals and thus maximizes uptime for your production lines.

Robust, wear-resistant core components tailored to high-load processing boost operational reliability and reduce unplanned downtime and replacement costs.

Precision-engineered wire path and process control systems deliver damage-free slicing with ultra-high material yield, minimizing material waste and operational costs.

  • General Silicon Wafer Slicing
  • Lab Tabletop & R&D Prototyping Systems
  • Single Loop & Multi-station Industrial Cutting Machines
  • Pilot & Mass Production Lines for Semiconductor Fabs
  • Compound Semiconductor Substrate Processing
  • Hard & Brittle Material Precision Slicing
NO.パラメータ仕様
1モデルEW-D2236
2ワークピースキャリアプレートのサイズ110 × 360 mm
3ワークピースの最大加工範囲220 × 360 mm
4切断の寸法精度±0.02 mm
5作業台の送り速度範囲0 ~ 1000 mm/h
6作業台の垂直方向の移動量200 mm
7ガイドホイールの数量8輪
8定格総出力22 kW
9外形寸法(長さ×幅×高さ)1942 × 1522 × 2200 mm
10総重量4800 kg
ewirexon - ewirexon precision diamond wire cutting system

Case Study:
High-Yield Silicon Wafer Slicing

A leading manufacturer of silicon wafers, compound semiconductors and advanced substrate solutions in Southeast Asia partnered with ewirexon to optimize its wafer slicing operations. By switching to our general semiconductor diamond wire cutting systems, the customer streamlined its slicing workflow and reduced equipment configuration complexity by 30%. The standardization of cutting solutions saved time and inventory costs while further boosting material yield and production throughput — which in turn helps end fabs reduce total cost of ownership.

Want to know more project cases? Feel free to write us!

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Thick glass core substrate blank being prepared with an endless diamond wire saw and controlled coolant

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